Atomic Layer Deposition of Antimony and its Compounds Using...

Chemistry of Materials 2011 / 01 Vol. 23; Iss. 2

Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony

Pore, Viljami, Knapas, Kjell, Hatanpää, Timo, Sarnet, Tiina, Kemell, Marianna, Ritala, Mikko, Leskelä, Markku, Mizohata, Kenichiro
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Volume:
23
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm102904f
Date:
January, 2011
File:
PDF, 2.22 MB
english, 2011
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