Concentration profiles of boron implantations in amorphous...

Concentration profiles of boron implantations in amorphous and polycrystalline silicon

Hofker, W. K., Oosthoek, D. P., Koeman, N. J., M. de grefte, H. A.
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Volume:
24
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/00337577508240811
Date:
January, 1975
File:
PDF, 698 KB
english, 1975
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