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Concentration profiles of boron implantations in amorphous and polycrystalline silicon
Hofker, W. K., Oosthoek, D. P., Koeman, N. J., M. de grefte, H. A.Volume:
24
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/00337577508240811
Date:
January, 1975
File:
PDF, 698 KB
english, 1975