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Dynamic repulsion of surface steps during step flow etching: Controlling surface roughness with chemistry
Huang, Yi-Chiau, Flidr, Jaroslav, Newton, Theresa A., Hines, Melissa A.Volume:
109
Year:
1998
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.477115
File:
PDF, 1.42 MB
english, 1998