Subsurface Incorporation of Co Atoms into Si(100)

The Journal of Physical Chemistry C 2011 / 08 Vol. 115; Iss. 31

Subsurface Incorporation of Co Atoms into Si(100)

Choi, Junghun, Kim, Youngwoo, Lim, Do Kyung, Kim, Do Hwan, Kim, Sehun
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Volume:
115
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/jp2037872
Date:
August, 2011
File:
PDF, 4.25 MB
english, 2011
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