HF Etchant Solutions in Supercritical Carbon Dioxide for...

Chemistry of Materials 2003 / 07 Vol. 15; Iss. 15

HF Etchant Solutions in Supercritical Carbon Dioxide for “Dry” Etch Processing of Microelectronic Devices

Jones, Charles A., Yang, Dongxing, Irene, Eugene A., Gross, Stephen M., Wagner, Mark, DeYoung, James, DeSimone, Joseph M.
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Volume:
15
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm034235w
Date:
July, 2003
File:
PDF, 88 KB
english, 2003
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