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Measurement of vanadium impurity in oxygen-implanted silicon by isotope dilution and resonance ionization mass spectrometry
Mayo, Santos., Fassett, John D., Kingston, Howard M., Walker, Richard J.Volume:
62
Language:
english
Journal:
Analytical Chemistry
DOI:
10.1021/ac00202a003
Date:
February, 1990
File:
PDF, 751 KB
english, 1990