Parametrization of the Stillinger-Weber potential for Si/N/H system and its application to simulations of silicon nitride film deposition with SiH4/NH3
Deng, Xiaodi, Song, Yixu, Li, JinChun, Pu, YikangVolume:
115
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4863841
Date:
February, 2014
File:
PDF, 2.36 MB
english, 2014