Model correction for the formation of amorphous silicon by...

Model correction for the formation of amorphous silicon by ion implantation

Dennis, John R., Hale, Edward B.
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Volume:
19
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/00337577308232220
Date:
January, 1973
File:
PDF, 200 KB
english, 1973
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