Nanoscale Patterning by UV Nanoimprint Lithography Using an Organometallic Resist
Acikgoz, Canet, Vratzov, Boris, Hempenius, Mark A., Vancso, G. Julius, Huskens, JurriaanVolume:
1
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am9005379
Date:
November, 2009
File:
PDF, 1.53 MB
english, 2009