Silane Activation by Ti(NMe 2...

Chemistry of Materials 1999 / 10 Vol. 11; Iss. 10

Silane Activation by Ti(NMe 2 ) 4 and NH 3 during Chemical Vapor Deposition of Ti−Si−N Films

Amato-Wierda, Carmela C., Norton, Edward T., Wierda, Derk A.
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Volume:
11
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm990174j
Date:
October, 1999
File:
PDF, 209 KB
english, 1999
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