The Etching Properties of Al 2...

Ferroelectrics 2009 / 06 Vol. 384; Iss. 1

The Etching Properties of Al 2 O 3 Thin Films in BCl 3 /Cl 2 /Ar Plasma

Xue-Yang,, Kim, Dong-Pyo, Kim, Gwan-Ha, Woo, Jong-Chang, Um, Doo-Seung, Kim, Chang-Il
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Volume:
384
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190902892741
Date:
June, 2009
File:
PDF, 2.64 MB
english, 2009
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