Atomic Layer Deposition of Ga 2...

Chemistry of Materials 2006 / 01 Vol. 18; Iss. 2

Atomic Layer Deposition of Ga 2 O 3 Films from a Dialkylamido-Based Precursor

Dezelah,, Niinistö, Jaakko, Arstila, Kai, Niinistö, Lauri, Winter, Charles H.
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Volume:
18
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm0521424
Date:
January, 2006
File:
PDF, 181 KB
english, 2006
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