Photo-Sensitive RAFT-Agents for Advanced Microparticle...

Macromolecules 2013 / 09 Vol. 46; Iss. 17

Photo-Sensitive RAFT-Agents for Advanced Microparticle Design

Kaupp, Michael, Tischer, Thomas, Hirschbiel, Astrid F., Vogt, Andrew P., Geckle, Udo, Trouillet, Vanessa, Hofe, Thorsten, Stenzel, Martina H., Barner-Kowollik, Christopher
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Volume:
46
Language:
english
Journal:
Macromolecules
DOI:
10.1021/ma401242g
Date:
September, 2013
File:
PDF, 2.34 MB
english, 2013
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