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HIGH DENSITY PLASMA ETCHING OF IrRu THIN FILMS AS A NEW ELECTRODE FOR FeRAM
LEE, JANG WOO, MIN, SU RYUN, CHO, HAN NA, CHUNG, CHEE WONVolume:
84
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580601085750
Date:
November, 2006
File:
PDF, 1.58 MB
english, 2006