The Formation of an Almost Full Atomic Monolayer via Surface Modification by N 2 O-Plasma in Atomic Layer Deposition of ZrO 2 Thin Films
Won, Seok-Jun, Kim, Ju-Youn, Choi, Gyu-Jin, Heo, Jaeyeong, Hwang, Cheol Seong, Kim, Hyeong JoonVolume:
21
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm9005234
Date:
October, 2009
File:
PDF, 1.31 MB
english, 2009