Photodissociation of Azulene at 193 nm:  Ab Initio and RRKM...

Journal of Physical Chemistry A 2005 / 10 Vol. 109; Iss. 39

Photodissociation of Azulene at 193 nm:  Ab Initio and RRKM Study

Dyakov, Yu. A., Ni, C.-K., Lin, S. H., Lee, Y. T., Mebel, A. M.
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Volume:
109
Language:
english
Journal:
The Journal of Physical Chemistry A
DOI:
10.1021/jp053218m
Date:
October, 2005
File:
PDF, 1001 KB
english, 2005
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