Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH 3 on Particles Agitated in a Rotary Reactor
Longrie, Delphine, Deduytsche, Davy, Haemers, Jo, Smet, Philippe F., Driesen, Kris, Detavernier, ChristopheVolume:
6
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am5007222
Date:
May, 2014
File:
PDF, 3.99 MB
english, 2014