![](/img/cover-not-exists.png)
[IEEE 2008 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2008) - Hakone-Machi, Kanagawa (2008.09.9-2008.09.11)] 2008 International Conference on Simulation of Semiconductor Processes and Devices - Mobility enhancement in thin silicon films: Strain and thickness dependences of the effective masses and non-parabolicity parameter
Sverdlov, Viktor, Windbacher, Thomas, Selberherr, SiegfriedYear:
2008
Language:
english
DOI:
10.1109/sispad.2008.4648258
File:
PDF, 816 KB
english, 2008