Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films
Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Klemberg-Sapieha, J. E., Nakanishi, Y., Aoki, T., Hatanaka, Y.Volume:
15
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm021250c
Date:
April, 2003
File:
PDF, 265 KB
english, 2003