Design of New Positive-Tone Photoresists Based on the...

Design of New Positive-Tone Photoresists Based on the Acid-Catalyzed Hydrolysis of Phenylmethanediol Diesters

Lee, S. Ming, Frechet, Jean M. J.
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Volume:
6
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00046a042
Date:
October, 1994
File:
PDF, 1.74 MB
english, 1994
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