Lithography with a Focused Soft X-ray Beam and a...

Langmuir 2004 / 03 Vol. 20; Iss. 6

Lithography with a Focused Soft X-ray Beam and a Monomolecular Resist

Klauser, Ruth, Huang, Mao-Lin, Wang, Shih-Chieh, Chen, Chia-Hao, Chuang, Tung Jung, Terfort, Andreas, Zharnikov, Michael
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Volume:
20
Language:
english
Journal:
Langmuir
DOI:
10.1021/la030398n
Date:
March, 2004
File:
PDF, 402 KB
english, 2004
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