Preparation and characterization of Nickel Oxide thin films...

Electronic Materials Letters 2014 / 09 Vol. 10; Iss. 5

Preparation and characterization of Nickel Oxide thin films by direct current reactive magnetron sputtering at different substrate temperatures

Reddy, A. Mallikarjuna, Byun, Chang Woo, Joo, Seung Ki, Reddy, A. Sivasankar, Reddy, P. Sreedhara
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Volume:
10
Language:
english
Journal:
Electronic Materials Letters
DOI:
10.1007/s13391-014-2181-3
Date:
September, 2014
File:
PDF, 502 KB
english, 2014
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