Metal-Organic Chemical Vapor Deposition of Ferroelectric...

Chemistry of Materials 2006 / 02 Vol. 18; Iss. 4

Metal-Organic Chemical Vapor Deposition of Ferroelectric SrBi 2 Ta 2 O 9 Films from a Fluorine-Containing Precursor System

Condorelli, G. G., Favazza, M., Bedoya, C., Baeri, A., Anastasi, G., Lo Nigro, R., Menou, N., Muller, C., Lisoni, J. G., Wouters, D., Fragalà, I. L.
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Volume:
18
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm051151+
Date:
February, 2006
File:
PDF, 435 KB
english, 2006
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