Nucleation kinetics of Ru on silicon oxide and silicon...

Journal of Applied Physics 2008 Vol. 103; Iss. 11

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

Yim, Sung-Soo, Lee, Do-Joong, Kim, Ki-Su, Kim, Soo-Hyun, Yoon, Tae-Sik, Kim, Ki-Bum
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Volume:
103
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2938052
File:
PDF, 738 KB
english, 2008
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