Lithography-free approach to highly efficient, scalable...

Nanotechnology 2013 / 12 Vol. 24; Iss. 50

Lithography-free approach to highly efficient, scalable SERS substrates based on disordered clusters of disc-on-pillar structures

Agapov, Rebecca L, Srijanto, Bernadeta, Fowler, Chris, Briggs, Dayrl, Lavrik, Nickolay V, Sepaniak, Michael J
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Volume:
24
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/24/50/505302
Date:
December, 2013
File:
PDF, 1.91 MB
english, 2013
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