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Thermal and Photochemical Cleavage of SiSi Double Bond in Tetrasila-1,3-diene
Uchiyama, Kei, Nagendran, Selvarajan, Ishida, Shintaro, Iwamoto, Takeaki, Kira, MitsuoVolume:
129
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja0741473
Date:
September, 2007
File:
PDF, 69 KB
english, 2007