Effect of ionic strength on ruthenium CMP in H2O2-based...

Applied Surface Science 2014 / 10 Vol. 317

Effect of ionic strength on ruthenium CMP in H2O2-based slurries

Jiang, Liang, He, Yongyong, Li, Yuzhuo, Luo, Jianbin
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Volume:
317
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.08.063
Date:
October, 2014
File:
PDF, 1.04 MB
english, 2014
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