Comparison of planar inductively coupled plasma etching of...

Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

J.W Lee, Y.T Lim, I.K Baek, S.Y Yoo, G.S Cho, M.H Jeoin, J.Y Leem, S.J Pearton
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Volume:
233
Year:
2004
Language:
english
Pages:
9
DOI:
10.1016/j.apsusc.2004.04.008
File:
PDF, 400 KB
english, 2004
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