Tight-binding quantum chemical molecular dynamics simulation of mechano-chemical reactions during chemical–mechanical polishing process of SiO2 surface by CeO2 particle
Arivazhagan Rajendran, Yasufumi Takahashi, Michihisa Koyama, Momoji Kubo, Akira MiyamotoVolume:
244
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2004.09.126
File:
PDF, 275 KB
english, 2005