Nanoporous Aluminum Oxide Thin Films on Si Substrate:...

The Journal of Physical Chemistry C 2011 / 04 Vol. 115; Iss. 15

Nanoporous Aluminum Oxide Thin Films on Si Substrate: Structural Changes as a Function of Interfacial Stress

Feil, Adriano F., Migowski, Pedro, Dupont, Jairton, Amaral, Lívio, Teixeira, Sérgio R.
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Volume:
115
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/jp200585c
Date:
April, 2011
File:
PDF, 4.56 MB
english, 2011
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