SIMS analysis of HfSiO(N) thin films

Applied Surface Science 2006 Vol. 252; Iss. 19

SIMS analysis of HfSiO(N) thin films

Shiro Miwa, Susumu Kusanagi, Hajime Kobayashi
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Volume:
252
Year:
2006
Language:
english
Pages:
3
DOI:
10.1016/j.apsusc.2006.02.093
File:
PDF, 366 KB
english, 2006
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