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Development of plasma-enhanced chemical vapor deposition microcrystalline silicon oxide as a replacement for N-type or back transparent conducting oxide layers in amorphous silicon single-junction solar cells 1
Liang, Shin-Wei, Hsu, Hung-Jung, Hsu, Cheng-Hang, Tsai, Chuang-ChuangVolume:
92
Journal:
Canadian Journal of Physics
DOI:
10.1139/cjp-2013-0631
Date:
July, 2014
File:
PDF, 296 KB
2014