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Effect of thermal annealing on microstructural properties of Ti/Ge2Sb2Te5/Ti thin films deposited on SiO2/Si substrates by a sputtering method
S.Y. Kim, H.S. Lee, I.S. Chung, Y.J. Park, J.Y. Lee, T.W. KimVolume:
253
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2006.08.038
File:
PDF, 453 KB
english, 2007