High-performance and damage-free neutral-beam etching...

High-performance and damage-free neutral-beam etching processes using negative ions in pulse-time-modulated plasma

Seiji Samukawa
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Volume:
253
Year:
2007
Language:
english
Pages:
9
DOI:
10.1016/j.apsusc.2007.02.003
File:
PDF, 1.38 MB
english, 2007
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