Hf1−xSixOy dielectric films deposited by UV-photo-induced chemical vapour deposition (UV-CVD)
M. Liu, L.Q. Zhu, G. He, Z.M. Wang, J.X. Wu, J.-Y. Zhang, I. Liaw, Q. Fang, Ian W. BoydVolume:
253
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2007.02.150
File:
PDF, 926 KB
english, 2007