Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering
Longyan Yuan, Guojia Fang, Chun Li, Mingjun Wang, Nishuang Liu, Lei Ai, Yanzhao Cheng, Huimin Gao, Xingzhong ZhaoVolume:
253
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2007.04.024
File:
PDF, 181 KB
english, 2007