Influence of thermal treatment of low dielectric constant SiOC(H) films using MTES/O2 deposited by PECVD
R. Navamathavan, Seung Hyun Kim, Yong Jun Jang, An Soo Jung, Chi Kyu ChoiVolume:
253
Year:
2007
Language:
english
Pages:
6
DOI:
10.1016/j.apsusc.2007.04.075
File:
PDF, 821 KB
english, 2007