Effect of high energy ion irradiation on silicon substrate...

Applied Surface Science 2007 Vol. 254; Iss. 1

Effect of high energy ion irradiation on silicon substrate in a pulsed plasma device

H. Bhuyan, M. Favre, E. Valderrama, G. Avaria, F. Guzman, H. Chuaqui, I. Mitchell, E. Wyndham, R. Saavedra, M. Paulraj
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Volume:
254
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2007.07.029
File:
PDF, 372 KB
english, 2007
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