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Characterization of ion beam sputter deposited W and Si films and W/Si interfaces by grazing incidence X-ray reflectivity, atomic force microscopy and spectroscopic ellipsometry
A. Biswas, A.K. Poswal, R.B. Tokas, D. BhattacharyyaVolume:
254
Year:
2008
Language:
english
Pages:
10
DOI:
10.1016/j.apsusc.2007.11.025
File:
PDF, 1.04 MB
english, 2008