Metal carbide-induced negative flatband voltage shift in...

Applied Surface Science 2008 Vol. 254; Iss. 19

Metal carbide-induced negative flatband voltage shift in TaCx and HfCx/HfO2 gate stacks

Wataru Mizubayashi, Koji Akiyama, Wenwu Wang, Minoru Ikeda, Kunihiko Iwamoto, Yuuichi Kamimuta, Akito Hirano, Hiroyuki Ota, Toshihide Nabatame, Akira Toriumi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
254
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2008.02.159
File:
PDF, 651 KB
english, 2008
Conversion to is in progress
Conversion to is failed