![](/img/cover-not-exists.png)
Metal carbide-induced negative flatband voltage shift in TaCx and HfCx/HfO2 gate stacks
Wataru Mizubayashi, Koji Akiyama, Wenwu Wang, Minoru Ikeda, Kunihiko Iwamoto, Yuuichi Kamimuta, Akito Hirano, Hiroyuki Ota, Toshihide Nabatame, Akira ToriumiVolume:
254
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2008.02.159
File:
PDF, 651 KB
english, 2008