XPS study of the O2/SF6 microwave plasma oxidation of...

Applied Surface Science 2009 Vol. 256; Iss. 1

XPS study of the O2/SF6 microwave plasma oxidation of (0 0 1) GaAs surfaces

G. Monier, L. Bideux, O. Desplats, C. Fontaine, C. Robert-Goumet, B. Gruzza
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Volume:
256
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2009.07.060
File:
PDF, 469 KB
english, 2009
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