Analysis of intensities of positive and negative ion species from silicon dioxide films using time-of-flight secondary ion mass spectrometry and electronegativity of fragments
Kiyoshi ChibaVolume:
256
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.apsusc.2009.09.085
File:
PDF, 555 KB
english, 2010