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Fabrication and characterization of La-doped HfO2 gate dielectrics by metal-organic chemical vapor deposition
Liu-Ying Huang, Ai-Dong Li, Wen-Qi Zhang, Hui Li, Yi-Dong Xia, Di WuVolume:
256
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2009.10.094
File:
PDF, 540 KB
english, 2010