Photocatalytic Lithography Processing via Poly(vinyl butyral)/TiO 2 Photoresists by Ultraviolet (UV) Exposure
Liau, Leo Chau-Kuang, Chou, Wen-Wei, Wu, Rung-KangVolume:
47
Language:
english
Journal:
Industrial & Engineering Chemistry Research
DOI:
10.1021/ie071331o
Date:
April, 2008
File:
PDF, 593 KB
english, 2008