A magnetron sputtering technique to prepare a-C:H films:...

Applied Surface Science 2011 Vol. 257; Iss. 6

A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias

Yongxia Wang, Yinping Ye, Hongxuan Li, Li Ji, Jianmin Chen, Huidi Zhou
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Volume:
257
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.apsusc.2010.09.040
File:
PDF, 1.06 MB
english, 2011
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