Assessment of interface roughness during plasma etching...

Applied Surface Science 2011 Vol. 257; Iss. 7

Assessment of interface roughness during plasma etching through the use of real-time ellipsometry

Chien-Yuan Han, Chien-Wen Lai, Yu-Faye Chao, Ke-Ciang Leou, Tsang-Lang Lin
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Volume:
257
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2010.10.018
File:
PDF, 510 KB
english, 2011
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