Optimization of inductively coupled plasma deep etching of...

Applied Surface Science 2011 Vol. 257; Iss. 7

Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis

Rongfu Qiu, Hai Lu, Dunjun Chen, Rong Zhang, Youdou Zheng
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Volume:
257
Year:
2011
Language:
english
Pages:
7
DOI:
10.1016/j.apsusc.2010.10.048
File:
PDF, 1.26 MB
english, 2011
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