Flattening of low temperature epitaxial...

Applied Surface Science 2011 Vol. 257; Iss. 9

Flattening of low temperature epitaxial Ge1−xSnx/Ge/Si(1 0 0) alloys via mass transport during post-growth annealing

Wei Wang, Shaojian Su, Jun Zheng, Guangze Zhang, Chunlai Xue, Yuhua Zuo, Buwen Cheng, Qiming Wang
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Volume:
257
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2010.12.094
File:
PDF, 948 KB
english, 2011
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