Preparation of a-Si 1-...

Japanese Journal of Applied Physics 1993 / 12 Vol. 32; Iss. Part 1, No

Preparation of a-Si 1- x N x :H Film Using N 2 Microwave Afterglow Chemical Vapor Deposition Method

Nagayoshi, Hiroshi, Hoe, Wong Chee, Noguchi, Haruya, Ueno, Tomo, Kamisako, Koichi, Kuroiwa, Koichi, Shimada, Toshikazu, Tarui, Yasuo
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.5791
Date:
December, 1993
File:
PDF, 716 KB
1993
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