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A single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in the chemical vapor deposition process
Winter, Charles H., Sheridan, Philip H., Lewkebandara, T. Suren, Heeg, Mary Jane, Proscia, James W.Volume:
114
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja00029a053
Date:
January, 1992
File:
PDF, 412 KB
english, 1992